HuiYi Tech. HuiYi Tech.

arious TSP have been developed, such as GFF, G1F, GF1, GFD(GF2), Gfxy. The conductive materials used in our production lines, such as ITO, AgNW, Metal Mesh, are all the same process equipment.

The lithography process equipment has developed an ultra-narrow frame pitch of 20um (10/10). The narrow frame TSP is the mainstream in the market.

1. Sheet & Roll to Roll Cleaner：

The equipment has the characteristics of power-saving design, new liquid dosing system, over-wetting system, and independent spray pressure adjustment.

● Substrate Size：600 mm
● Substrate thickness: 0.025m m~0.1m m
● Production speed): 4.0 M/min; 1~5 M/min adjustable
● Rotation method: Outside
● Working height：1200 mm±25
● Conveying width:700 mm /Produce effective width.
● Roller spacing: 100 mm.
● Power supply)：AC 380V,50Hz Three-phase five-wire

2. Anneal (Sheet & Roll to Roll Anneal)：

This system is continuously transfer the pet film and take heat treatment process on film. heating with far-infrared radiation, consist of unwinding, rewinding and control module.

3. Metal Sputter (Sheet & Roll to Roll Sputter)：

Roll to roll sputtering system provide oneside magnetron deposition of various metal layers and TCO layers on polymer film to be vacuum coated in the production of touch screens, electronic displays, solar cell and flexible circuitry.

● Substrate Size:600-1200 mm
● Substrate thickness: 0.025m m~0.1m m
● Production speed: Max. 0.1~12.0m/min
● Power supply: AC380V 160KW, AC220V 50KW / 3phase, 50~60Hz
● Vacuum: 9.00-6E

4. PF Lamination：

The DFR laminating machine is used for laminating the metal layer on the film on the upper and lower sides of the dry film (DFR) or protective film in the winding section.

5. LPR Lamination：

Combine various devices or processes (post-processing/subsequent processing unit and drying/hardening device integration, not using printing process) to combine the final device. Through the exclusive development of various processes for the R2R system, the optimized equipment plan is completed.

6. Sheet & Roll to Roll Exposure：

Roll to Roll Exposure is simultaneous top and bottom roll to roll exposing process on DFR (or LPR) Laminated Pet Film.

7. Sheet & Roll to Roll Develop：

Roll to Roll Develop helps to develop top and bottom film with DFR (Dry Film Resist) by horizontal roll to roll process.

The equipment has the characteristics of power-saving design, new liquid dosing system, over-wetting system, and independent spray pressure adjustment.

● Substrate Size:600 mm
● Substrate thickness: 0.025m m~0.1m m
● Production speed:4.0 M/min; 1~5 M/min adjustable
● Rotation method: Outside
● Working height:1200 mm±25
● Conveying width:700 mm /Produce effective width.
● Roller spacing: 100 mm
● Power supply: AC 380V,50Hz Three-phase five-wire

8. Sheet & Roll to Roll Etch：

Roll to Roll Etching helps to etch developed area of top and bottom film with Chemical by horizontal roll to roll process.

● Substrate Size :600 mm
● Substrate thickness: 0.05 mm ~ 0.2 mm
● Production speed: 4.0 M/min; 1~5 M/min adjustable
● Dry film thickness: 7~15um
● Etch line width: 10/10~30/30um
● Power supply：AC380V, 5 0 Hz Three-phase five-wire

9. Sheet & Roll to Roll Strip：

Roll to Roll Strip helps to strip top and bottom film with Dry Film Resist by horizontal roll to roll process.

● Substrate Size：600 mm
● Substrate thickness: 0.025mm~0.1mm
● Production speed: 4.0 M/min; 1~5 M/min adjustable
● Working height：1200 mm±25
● Conveying width: 700mm/Produce effective width.
● Dry film thickness): 7~15um
● Etch line width: 10/10~30/30um
● Power supply： AC380V, 5 0 Hz Three-phase five-wire